Friday, September 07, 2012

Characterization of Impurity Doping and Stress in Si/Ge and Ge/Si Core–Shell Nanowires

Naoki Fukata, Masanori Mitome, Takashi Sekiguchi, Yoshio Bando, Melanie Kirkham, Jung-Il Hong, Zhong Lin Wang and Robert L. Snyder



TOC Graphic


ACS Nano

DOI: 10.1021/nn302881w






Link to full article

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