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Thursday, September 13, 2012
Mass and Electron Balance for the Oxidation of Silicon during the Wet Chemical Etching in HF/HNO3 Mixtures
Jörg Acker, Anja Rietig, Marco Steinert and Volker Hoffmann
The Journal of Physical Chemistry C
DOI: 10.1021/jp305621h
Link to full article
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