Thursday, September 13, 2012

Mass and Electron Balance for the Oxidation of Silicon during the Wet Chemical Etching in HF/HNO3 Mixtures

Jörg Acker, Anja Rietig, Marco Steinert and Volker Hoffmann



TOC Graphic


The Journal of Physical Chemistry C

DOI: 10.1021/jp305621h






Link to full article

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