Thursday, September 06, 2012

Stabilization of Tetragonal HfO2 under Low Active Oxygen Source Environment in Atomic Layer Deposition

Deok-Yong Cho, Hyung Suk Jung, Il-Hyuk Yu, Jung Ho Yoon, Hyo Kyeom Kim, Sang Young Lee, Sang Ho Jeon, Seungwu Han, Jeong Hwan Kim, Tae Joo Park, Byeong-Gyu Park and Cheol Seong Hwang



TOC Graphic


Chemistry of Materials

DOI: 10.1021/cm3001199






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