Wednesday, October 17, 2012

Effect of radical fluorination on mono- and bi-layer graphene in Ar/F2 plasma

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K. Tahara, T. Iwasaki, and A. Matsutani et al.

Fluorinated graphene has the possibility to achieve unique properties and functions in graphene. We propose a highly controlled fluorination method utilizing fluorine radicals in Ar/F2 plasma. To suppress ion bombardments and improve the reaction with fluorine radicals on graphene, the substrate w ... [Appl. Phys. Lett. 101, 163105 (2012)] published Wed Oct 17, 2012.



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