Thursday, October 04, 2012

Initial Stages of Atomic Layer Deposition of Tantalum Nitride on SiO2 and Porous Low-κ Substrates Modified by a Branched Interfacial Organic Layer: Chemisorption and the Transition to Steady-State Growth

Kevin J. Hughes, Abhishek Dube, Manish Sharma and James R. Engstrom



TOC Graphic


The Journal of Physical Chemistry C

DOI: 10.1021/jp3086232






Link to full article

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