Friday, October 05, 2012

Quantifying Resistances across Nanoscale Low- and High-Angle Interspherulite Boundaries in Solution-Processed Organic Semiconductor Thin Films

Stephanie S. Lee, Jeffrey M. Mativetsky, Marsha A. Loth, John E. Anthony and Yueh-Lin Loo



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ACS Nano

DOI: 10.1021/nn303446h






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