D Jalabert, Y Curé, K Hestroffer, Y M Niquet and B Daudin
Medium energy ion spectroscopy experiments have been performed on an ensemble of nanowires deposited by molecular beam epitaxy on Si(111), taking advantage of their reduced in-plane mosaicity. In particular, the strain in nanometric GaN insertions embedded in AlN sections deposited on top of GaN nanowires has been determined. The measured strain is consistent with atomistic valence force field calculations. This opens the way for the structural study of a new range of discontinuous nanowire-based nanostructures by medium energy ion spectroscopy and to the determination of the strain profile of nanodisks in nanowires at the monolayer scale.
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Medium energy ion spectroscopy experiments have been performed on an ensemble of nanowires deposited by molecular beam epitaxy on Si(111), taking advantage of their reduced in-plane mosaicity. In particular, the strain in nanometric GaN insertions embedded in AlN sections deposited on top of GaN nanowires has been determined. The measured strain is consistent with atomistic valence force field calculations. This opens the way for the structural study of a new range of discontinuous nanowire-based nanostructures by medium energy ion spectroscopy and to the determination of the strain profile of nanodisks in nanowires at the monolayer scale.
Link to full article
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