Wednesday, April 10, 2013

Atomic Layer Deposition of LiF Thin Films from Lithd, Mg(thd)2, and TiF4 Precursors

Miia Mäntymäki, Jani Hämäläinen, Esa Puukilainen, Timo Sajavaara, Mikko Ritala and Markku Leskelä



TOC Graphic


Chemistry of Materials

DOI: 10.1021/cm400046w






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