Wednesday, April 17, 2013

Fabrication of TiO 2 nano-to-microscale structures using UV nanoimprint lithography

Je-Hong Choi, Han-Byeol Jo, Hak-Jong Choi and Heon Lee



TiO 2 -nanoparticle-dispersed resin was prepared to form various nanoscaled structures using UV nanoimprint lithography (UV NIL). This resin—made of TiO 2 nanoparticles, a monomer, solvent, and UV initiator—showed variations in refractive index depending on the nanoparticle concentration. TiO 2 nano-to-microscale patterns were fabricated on various substrates such as Si wafer and glass, and even on flexible substrates, by using UV NIL, which offers advantages such as low cost, large area, and high throughput. Low-aspect-ratio, high-aspect-ratio, and microconvex patterns were fabricated using the NIL process. The optical properties of the patterns were analyzed using UV–vis spectrophotometry.



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