Thursday, September 18, 2014

Robust 2D Topological Insulators in van der Waals Heterostructures

TOC Graphic


ACS Nano

DOI: 10.1021/nn503789v




Liangzhi Kou, Shu-Chun Wu, Claudia Felser, Thomas Frauenheim, Changfeng Chen and Binghai Yan

Click for full article
Posted by at
Labels: ,

No comments:

Post a Comment

Subscribe to: Post Comments (Atom)