Tuesday, September 09, 2014

Tight-Binding Quantum Chemical Molecular Dynamics Simulations of Mechanisms of SiO2 Etching Processes for CF2 and CF3 Radicals

TOC Graphic


The Journal of Physical Chemistry C

DOI: 10.1021/jp5015252




Hiroshi Ito, Takuya Kuwahara, Kentaro Kawaguchi, Yuji Higuchi, Nobuki Ozawa, Seiji Samukawa and Momoji Kubo

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