Nanoscale , 2014, Accepted Manuscript
DOI: 10.1039/C4NR05049E, Paper
DOI: 10.1039/C4NR05049E, Paper
Jolien Dendooven, Kilian Devloo-Casier, Matthias Ide, Kathryn Grandfield, Mert Kurttepeli, Karl Ludwig, Sara Bals, Pascal Van Der Voort, Christophe Detavernier
Atomic layer deposition (ALD) enables the conformal coating of porous materials, making the technique suitable for pore size tuning at the atomic level, e.g., for applications in catalysis, gas separation...
The content of this RSS Feed (c) The Royal Society of Chemistry
Atomic layer deposition (ALD) enables the conformal coating of porous materials, making the technique suitable for pore size tuning at the atomic level, e.g., for applications in catalysis, gas separation...
The content of this RSS Feed (c) The Royal Society of Chemistry
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