Tuesday, October 14, 2014

Novel chemical route for atomic layer deposition of MoS2 thin film on SiO2/Si substrate

Nanoscale , 2014, Accepted Manuscript

DOI: 10.1039/C4NR04816D, Paper

Zhenyu Jin, Seokhee Shin, Do Hyun Kwon, Seung-Joo Han, Yo-Sep Min

Recently MoS2 with a two-dimensional layered structure has attracted great attention as an emerging material for electronics and catalysis applications. Although atomic layer deposition (ALD) is well-known as a special...

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