Nanoscale , 2014, 6,15216-15221
DOI: 10.1039/C4NR04726E, Paper
DOI: 10.1039/C4NR04726E, Paper
Woon Ik Park, Sheng Tong, Yuzi Liu, Il Woong Jung, Andreas Roelofs, Seungbum Hong
Pattern generation of well-controlled block copolymers (BCPs) with a high Flory-Huggins interaction parameter ([small chi]) is important for applications in sub-20 nm nanolithography.
The content of this RSS Feed (c) The Royal Society of Chemistry
Pattern generation of well-controlled block copolymers (BCPs) with a high Flory-Huggins interaction parameter ([small chi]) is important for applications in sub-20 nm nanolithography.
The content of this RSS Feed (c) The Royal Society of Chemistry
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