Monday, March 23, 2015

Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer




Nanoscale , 2015, Advance Article

DOI: 10.1039/C4NR07679F, Paper

Cian Cummins, Anushka Gangnaik, Roisin A. Kelly, Dipu Borah, John O'Connell, Nikolay Petkov, Yordan M. Georgiev, Justin D. Holmes, Michael A. Morris

A strategy combining graphoepitaxy and a metal oxide enhanced PS-b-P4VP BCP is utilized for generating aligned Si nanofins with 10 nm feature sizes.

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