Wednesday, March 11, 2015

Cooperation between adsorbates accounts for the activation of atomic layer deposition reactions

Nanoscale , 2015, Accepted Manuscript

DOI: 10.1039/C5NR00900F, Paper

mahdi shirazi, Simon D. Elliott

Atomic layer deposition (ALD) is a technique for producing conformal layers of nanometre-scale thickness, used commercially in non-planar electronics and increasingly in other high-tech industries. ALD depends on self-limiting surface...

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