Thursday, March 05, 2015

Defect States below the Conduction Band Edge of HfO2 Grown on InP by Atomic Layer Deposition

TOC Graphic


The Journal of Physical Chemistry C

DOI: 10.1021/jp511666m




Yu-Seon Kang, Dae-Kyoung Kim, Hang-Kyu Kang, Sangwan Cho, Sungho Choi, Hyoungsub Kim, Jung-Hye Seo, Jouhahn Lee and Mann-Ho Cho

Click for full article
Posted by at
Labels: ,

No comments:

Post a Comment

Subscribe to: Post Comments (Atom)