Nanoscale , 2015, 7,7331-7339
DOI: 10.1039/C5NR00181A, Paper
DOI: 10.1039/C5NR00181A, Paper
Jianbiao Lu, Ruiqiang Guo, Weijing Dai, Baoling Huang
P-Type polycrystalline silicon-germanium thin films are grown by low-pressure chemical vapor deposition and their thermoelectric properties are characterized from 120 K to 300 K for potential application in integrated microscale cooling.
The content of this RSS Feed (c) The Royal Society of Chemistry
P-Type polycrystalline silicon-germanium thin films are grown by low-pressure chemical vapor deposition and their thermoelectric properties are characterized from 120 K to 300 K for potential application in integrated microscale cooling.
The content of this RSS Feed (c) The Royal Society of Chemistry
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