Nanoimprint lithography 20 years on

To celebrate the 20th anniversary of nanoimprint lithography (NIL) we present a perspective of how the technique and its prospects have evolved over the past two decades. We describe how it overcame certain fabrication challenges at the time it was first reported and look at some of the obstacles that hindered uptake in industry initially, as well as likely sectors for future successful commercial deployment. Developments in the technique since that are making NIL increasingly attractive such as ‘moving roll to roll’ for higher throughput, are also described.

Qiangfei Xia and R Fabian Pease

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