Nanoscale , 2015, Advance Article
DOI: 10.1039/C5NR00904A, Paper
DOI: 10.1039/C5NR00904A, Paper
Xiao Li, Xinming Li, Xiaobei Zang, Miao Zhu, Yijia He, Kunlin Wang, Dan Xie, Hongwei Zhu
In the two-step chemical vapor deposition growth of MoS2 , hydrogen plays crucial roles as an inhibitor of the thermal-induced etching effect and as a promoter of desulfurization and oxidation of the obtained MoSx films.
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In the two-step chemical vapor deposition growth of MoS2 , hydrogen plays crucial roles as an inhibitor of the thermal-induced etching effect and as a promoter of desulfurization and oxidation of the obtained MoSx films.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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