Nanoscale, 2015, Advance Article
DOI: 10.1039/C5NR01486G, Paper
DOI: 10.1039/C5NR01486G, Paper
Jaehyun Yang, Yeahyun Gu, Eunha Lee, Hyangsook Lee, Sang Han Park, Mann-Ho Cho, Yong Ho Kim, Yong-Hoon Kim, Hyoungsub Kim
Highly thickness controllable growth of uniform MoS2 thin films on the wafer-scale via a spin-coating route.
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Highly thickness controllable growth of uniform MoS2 thin films on the wafer-scale via a spin-coating route.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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