Wednesday, June 03, 2015

Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides

Nanoscale, 2015, Advance Article
DOI: 10.1039/C5NR01128K, Paper
Amirhasan Nourbakhsh, Christoph Adelmann, Yi Song, Chang Seung Lee, Inge Asselberghs, Cedric Huyghebaert, Simone Brizzi, Massimo Tallarida, Dieter Schmei[German sz ligature}er, Sven Van Elshocht, Marc Heyns, Jing Kong, Tomas Palacios, Stefan De Gendt
Graphene oxide was explored as an atomically-thin transferable seed layer for the ALD of metal-oxides.
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