Nanoscale, 2015, Advance Article
DOI: 10.1039/C5NR02786A, Paper
DOI: 10.1039/C5NR02786A, Paper
Namsoo Lim, Yusin Pak, Jin Tae Kim, Youngkyu Hwang, Ryeri Lee, Yogeenth Kumaresan, NoSoung Myoung, Heung Cho Ko, Gun Young Jung
A PMMA interlayer dramatically reduces unwanted surface etching at the gap under the AAO membrane mask, resulting in a smooth silicon nanopore array (SiNPs) at sub-100 nm range.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
A PMMA interlayer dramatically reduces unwanted surface etching at the gap under the AAO membrane mask, resulting in a smooth silicon nanopore array (SiNPs) at sub-100 nm range.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
Click for full article
No comments:
Post a Comment