Monday, July 13, 2015

Atomic Layer Deposition of Cobalt Silicide Thin Films Studied by in Situ Infrared Spectroscopy

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Chemistry of Materials
DOI: 10.1021/acs.chemmater.5b00743

Karla Bernal-Ramos, Mark J. Saly, Ravindra K. Kanjolia and Yves J. Chabal
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