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Thursday, August 20, 2015
Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
Chemistry of Materials
DOI: 10.1021/acs.chemmater.5b02137
Zheng Guo, Hao Li, Qiang Chen, Lijun Sang, Lizhen Yang, Zhongwei Liu and Xinwei Wang
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