Thursday, August 27, 2015

Nanoimprint-Assisted Shear Exfoliation (NASE) for Producing Multilayer MoS2 Structures as Field-Effect Transistor Channel Arrays

TOC Graphic

ACS Nano
DOI: 10.1021/acsnano.5b01715

Mikai Chen, Hongsuk Nam, Hossein Rokni, Sungjin Wi, Jeong Seop Yoon, Pengyu Chen, Katsuo Kurabayashi, Wei Lu and Xiaogan Liang
Click for full article

No comments:

Post a Comment