Nanoscale, 2015, Advance Article
DOI: 10.1039/C5NR02584B, Paper
DOI: 10.1039/C5NR02584B, Paper
Michele Perego, Gabriele Seguini, Elisa Arduca, Jacopo Frascaroli, Davide De Salvador, Massimo Mastromatteo, Alberto Carnera, Giuseppe Nicotra, Mario Scuderi, Corrado Spinella, Giuliana Impellizzeri, Cristina Lenardi, Enrico Napolitani
An energy barrier of 0.9 eV guarantees stable incorporation of P atoms in Si nanocrystals embedded in SiO2.
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The content of this RSS Feed (c) The Royal Society of Chemistry
An energy barrier of 0.9 eV guarantees stable incorporation of P atoms in Si nanocrystals embedded in SiO2.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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