Thursday, November 26, 2015

Substrate tolerant direct block copolymer nanolithography

Nanoscale, 2015, Advance Article
DOI: 10.1039/C5NR06815K, Communication
Tao Li, Zhongli Wang, Lars Schulte, Sokol Ndoni
Sub-20 nm block copolymer films directly applied on substrates and annealed in vapors of selective solvents significantly simplify the lithographic process.
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