Wednesday, April 18, 2012

Ultra-Low-Temperature Epitaxy of Ge-based Semiconductors and Optoelectronic Structures on Si(100): Introducing Higher Order Germanes (Ge3H8, Ge4H10)

Gordon Grzybowski, Liying Jiang, Richard T. Beeler, Tylan Watkins, Andrew V. G. Chizmeshya, Chi Xu, José Menéndez and John Kouvetakis



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