OWL-Based Nanomasks for Preparing Graphene Ribbons with Sub-10 nm Gaps

Xiaozhu Zhou, Chad M. Shade, Abrin L. Schmucker, Keith A. Brown, Shu He, Freddy Boey, Jan Ma, Hua Zhang and Chad A. Mirkin

Nano Letters

DOI: 10.1021/nl302171z

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