Highly Selective Chemical Vapor Deposition of Tin Diselenide Thin Films onto Patterned Substrates via Single Source Diselenoether Precursors

C. H. (Kees) de Groot, Chitra Gurnani, Andrew L. Hector, Ruomeng Huang, Marek Jura, William Levason and Gillian Reid

Chemistry of Materials

DOI: 10.1021/cm302864x

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