In Situ Reaction Mechanism Studies on Atomic Layer Deposition of AlxSiyOz from Trimethylaluminium, Hexakis(ethylamino)disilane, and Water

Yoann Tomczak, Kjell Knapas, Suvi Haukka, Marianna Kemell, Mikko Heikkilä, Marcel Ceccato, Markku Leskelä and Mikko Ritala

Chemistry of Materials

DOI: 10.1021/cm301658m

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