Photoelectrochemical Behavior of n-type Si(100) Electrodes Coated with Thin Films of Manganese Oxide Grown by Atomic Layer Deposition

Nicholas C. Strandwitz, David J. Comstock, Ronald L. Grimm, Adam C. Nichols-Nielander, Jeffrey Elam and Nathan S. Lewis

The Journal of Physical Chemistry C

DOI: 10.1021/jp311207x

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