Reaching the Theoretical Resonance Quality Factor Limit in Coaxial Plasmonic Nanoresonators Fabricated by Helium Ion Lithography

M. Melli, A. Polyakov, D. Gargas, C. Huynh, L. Scipioni, W. Bao, D. F. Ogletree, P. J. Schuck, S. Cabrini and A. Weber-Bargioni

Nano Letters

DOI: 10.1021/nl400844a

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