Self-Terminating Protocol for an Interfacial Complexation Reaction in Vacuo by Metal–Organic Chemical Vapor Deposition

Anthoula C. Papageorgiou, Sybille Fischer, Seung Cheol Oh, Özge Sağlam, Joachim Reichert, Alissa Wiengarten, Knud Seufert, Saranyan Vijayaraghavan, David Écija, Willi Auwärter, Francesco Allegretti, Robert G. Acres, Kevin C. Prince, Katharina Diller, Florian Klappenberger and Johannes V. Barth

ACS Nano

DOI: 10.1021/nn401171z

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