Wednesday, July 24, 2013

Copper-Vapor-Assisted Chemical Vapor Deposition for High-Quality and Metal-Free Single-Layer Graphene on Amorphous SiO2 Substrate

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ACS Nano

DOI: 10.1021/nn402847w




Hyungki Kim, Intek Song, Chibeom Park, Minhyeok Son, Misun Hong, Youngwook Kim, Jun Sung Kim, Hyun-Joon Shin, Jaeyoon Baik and Hee Cheul Choi

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