Controlling the Atomic Layer Deposition of Titanium Dioxide on Silicon: Dependence on Surface Termination

The Journal of Physical Chemistry C

DOI: 10.1021/jp4060022

Stephen McDonnell, Roberto C. Longo, Oliver Seitz, Josh B. Ballard, Greg Mordi, Don Dick, James H. G. Owen, John N. Randall, Jiyoung Kim, Yves J. Chabal, Kyeongjae Cho and Robert M. Wallace

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