First-Principles Study of a Full Cycle of Atomic Layer Deposition of SiO2 Thin Films with Di(sec-butylamino)silane and Ozone

The Journal of Physical Chemistry C

DOI: 10.1021/jp405541x

Liang Huang, Bo Han, Bing Han, Agnes Derecskei-Kovacs, Manchao Xiao, Xinjian Lei, Mark L. O’Neill, Ronald M. Pearlstein, Haripin Chandra and Hansong Cheng

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