Graphene as discharge layer for electron beam lithography on insulating substrate

Junku Liu, Qunqing Li, and Mengxin Ren et al.

Charging of insulating substrates is a common problem during Electron Beam lithography (EBL), which deflects the beam and distorts the pattern. A homogeneous, electrically conductive, and transparent graphene layer is used as a discharge layer for EBL processes on insulating substrates. The EBL re ... [Appl. Phys. Lett. 103, 113107 (2013)] published Thu Sep 12, 2013.



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