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Wednesday, September 18, 2013

Next-generation nanotechnology laboratories with simultaneous reduction of all relevant disturbances




Nanoscale , 2013, Advance Article

DOI: 10.1039/C3NR03373B, Paper

Emanuel Lortscher, Daniel Widmer, Bernd Gotsmann

A novel laboratory concept has been developed to screen simultaneously all disturbances relevant for nanotechnology, hence enabling the most sensitive measurements to be conducted.

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