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Thursday, September 19, 2013

Realization of Thin Film Encapsulation by Atomic Layer Deposition of Al2O3 at Low Temperature

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The Journal of Physical Chemistry C

DOI: 10.1021/jp406738h




Yong-Qiang Yang, Yu Duan, Ping Chen, Feng-Bo Sun, Ya-Hui Duan, Xiao Wang and Dan Yang

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