Temperature-Dependent Reduction of Epitaxial Ce1–xPrxO2−δ (x = 0–1) Thin Films on Si(111): A Combined Temperature-Programmed Desorption, X-ray Diffraction, X-ray Photoelectron Spectroscopy, and Raman Study
The Journal of Physical Chemistry C
DOI: 10.1021/jp4082867
Marvin Hartwig Zoellner, Gang Niu, Jin-Hao Jhang, Andreas Schaefer, Peter Zaumseil, Marcus Bäumer and Thomas Schroeder
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