Silicon Monomer Formation and Surface Patterning of Si(001)-2 × 1 Following Tetraethoxysilane Dissociative Adsorption at Room Temperature

The Journal of Physical Chemistry C

DOI: 10.1021/jp407411k

Héloise Tissot, Jean-Jacques Gallet, Fabrice Bournel, Ahmed Naitabdi, Debora Pierucci, Federica Bondino, Elena Magnano, François Rochet and Fabio Finocchi

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