Asymmetric Growth of Bilayer Graphene on Copper Enclosures Using Low-Pressure Chemical Vapor Deposition

ACS Nano

DOI: 10.1021/nn5015177

Wenjing Fang, Allen L. Hsu, Yi Song, Anthony G. Birdwell, Matin Amani, Madan Dubey, Mildred S. Dresselhaus, Tomás Palacios and Jing Kong

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