Influence of the Oxygen Substoichiometry and of the Hydrogen Incorporation on the Electronic Band Structure of Amorphous Tungsten Oxide Films

The Journal of Physical Chemistry C

DOI: 10.1021/jp502092h

Maria Vasilopoulou, Ioannis Kostis, Nikolaos Vourdas, Giorgos Papadimitropoulos, Antonios Douvas, Nikolaos Boukos, Stella Kennou and Dimitris Davazoglou

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