Reliable Control of Filament Formation in Resistive Memories by Self-Assembled Nanoinsulators Derived from a Block Copolymer

ACS Nano

DOI: 10.1021/nn503713f

Byoung Kuk You, Woon Ik Park, Jong Min Kim, Kwi-Il Park, Hyeon Kook Seo, Jeong Yong Lee, Yeon Sik Jung and Keon Jae Lee

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