Role of Interfacial Aluminum Silicate and Silicon as Barrier Layers for Atomic Layer Deposition of Al2O3 Films on Chemically Cleaned InP(100) Surfaces

The Journal of Physical Chemistry C

DOI: 10.1021/jp5052084

Wilfredo Cabrera, Mathew D. Halls, Ian M. Povey and Yves J. Chabal

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