Thermal Atomic Layer Deposition of Titanium Films Using Titanium Tetrachloride and 2-Methyl-1,4-bis(trimethylsilyl)-2,5-cyclohexadiene or 1,4-Bis(trimethylsilyl)-1,4-dihydropyrazine

Chemistry of Materials

DOI: 10.1021/acs.chemmater.5b01707

Joseph P. Klesko, Christopher M. Thrush and Charles H. Winter
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