Effect of the Ligand Structure on Chemical Vapor Deposition of WNxCy Thin Films from Tungsten Nitrido Complexes of the Type WN(NR2)3

Chemistry of Materials

DOI: 10.1021/acs.chemmater.5b03691

Arijit Koley, Christopher T. O’Donohue, Michelle M. Nolan, K. Randall McClain, Richard O. Bonsu, Roman Y. Korotkov, Tim Anderson and Lisa McElwee-White
Click for full article