Layered nano-gratings by electron beam writing to form 3-level diffractive optical elements for 3D phase-offset holographic lithography

Nanoscale, 2015, Advance Article
DOI: 10.1039/C5NR06822C, Communication

Liang (Leon) Yuan, Peter R. Herman
Three-level nano-grating phase masks fabricated by e-beam lithography provided a diamond-like symmetry in holographic exposure and promised 3D complete stopbands.
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